SEMATECH and ASML Form Partnership at UAlbany NanoCollege to Tackle Crucial EUVL Challenge

As a member of the Lithography program, ASML will team with researchers at SEMATECH to advance EUV (extreme ultraviolet) lithography technology and its associate infrastructure components, including mask defect reduction, mask metrology infrastructure, source development, resist and materials development, and overall manufacturability and extendibility.

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