Major Milestone for Cambridge NanoTech: 300th ALD System Shipped

CAMBRIDGE, MA--(Marketwire -02/28/12)- Cambridge NanoTech, the world leader in Atomic Layer Deposition (ALD) science and equipment, has completed delivery of its 300th system to the Institute of Coal Chemistry (ICC) in Shanxi, China. Marking as a milestone for the company, Cambridge NanoTech's ALD systems have become an important strategic solution for researchers and manufacturers that require digital control for a variety of materials such as oxides, nitrides, sulfides, and metals.

The Institute of Coal Chemistry is a high-tech research and development institution affiliated with the Chinese Academy of Sciences (CAS). The Savannah will be the first ALD tool in their diverse R&D facility. "We chose the Savannah ALD system because we found that it was easy to get precise, uniform films, especially when trying new and novel precursors," explained Dr. Yong Qin, professor at State Key Laboratory of Coal Conversion, ICC. "We plan to use the Savannah for the ALD of supported nanocatalysts for applications in industrial catalysis. We expect the Savannah to be the workhorse of the lab, allowing us to run thermal process with little to no maintenance." The ICC will be working with a number of different materials including, TiO(2), SnO(2), VO(x), Pt, and Ru.

Cambridge NanoTech first introduced the Savannah ALD system nine years ago and has since expanded the world's most popular ALD system into three models: S100, S200, and S300. As a leader in the ALD industry, Cambridge NanoTech has expanded its product offerings to include the Fiji plasma-enhanced ALD systems for R&D and the Phoenix and Tahiti systems for batch and large area production needs.

"The widespread adoption of this technology, proliferation of the Savannah system and growth of ALD applications are helping accelerate the transformation of everyday products," said Jill Becker, CEO and founder of Cambridge NanoTech. "Six continents and thousands of research papers later, the Savannah ALD system has grown to become to gold standard for thermal ALD systems. Our team could not be more proud of this delivery as it is a testament to our systems, the versatility of ALD, and the market demand for this technology."

In addition to this milestone, earlier this month Cambridge NanoTech launched their first webinar series titled "What is Atomic Layer Deposition and Why Should You Care?" The first series of webinars focused on ALD basics and was attended by over 275 participants from 32 countries. "Modern technologies are dramatically changing the way we share information," explains Becker. "We are excited to be at the forefront of these social technologies, evangelizing Atomic Layer Deposition and providing people with tools that enable their material science solutions." Cambridge NanoTech's future webinars will feature topics ranging from the benefits of plasma ALD to the growth of self assembled monolayers. For more information on upcoming Cambridge NanoTech webinars, visit http://www.cambridgenanotech.com/seminars.

About the Institute of Coal Chemistry
The Institute of Coal Chemistry (ICC) is one of the high-tech research and development institutions affiliated with the Chinese Academy of Sciences (CAS). ICC mainly conducts basic and applied research in three academic scopes such as energy and environment, advanced materials and green chemistry.

About Cambridge NanoTech
Cambridge NanoTech delivers Atomic Layer Deposition (ALD) systems capable of depositing ultra-thin films that are used in a wide variety of research and industrial applications. Our manufacturing ALD systems are used in the production of semiconductors, flat panel displays, and solid state lighting. Cambridge NanoTech research systems are used by world class scientists on five continents to study superior ALD film properties such as electrical, anti-bacterial, UV-blocking, and anti-reflection. To learn more about Cambridge NanoTech, please visit http://www.cambridgenanotech.com.

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Major Milestone for Cambridge NanoTech: 300th ALD System Shipped

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