The TEL team will work alongside SEMATECH engineers at CNSE's Albany NanoTech Complex to advance extreme ultraviolet lithography (EUVL) and related infrastructure - including mask defect reduction, mask metrology, source, resist processing, etch, and overall manufacturability and extensibility of the technology.
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- Julian Wess Award for outstanding achievements in elementary particle and astroparticle physics [Last Updated On: December 13th, 2009] [Originally Added On: December 13th, 2009]
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