Quantum dots have been receiving extensive attention from researchers because they can be widely used for basic physics study, quantum computing, biological imaging, nanoelectronics, and photonics applications. Current major fabrication methods for semiconductor quantum dots all have certain drawbacks. Comparing all these methods, the electrical depletion method has many advantages, such as electrical tunability by gate contacts, smooth confinement boundaries, good control and uniformity if the top gate patterns are uniform enough. Researchers have now, for the first time, applied the electrical depletion method to quantum wells and generate a large area of uniform quantum dots using a uniform metallic nanoholes array on top of quantum wells. This design for forming quantum dots has inherited all the advantages of the electrical depletion method. Furthermore, it can produce millions of uniform quantum dots easily, precisely, and controllably, which will help realize the wide applications of quantum dots in many areas.